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    1. Photoresist
      Photoresist.jpg

      • Photopex UPE 2nm removal retention. Using dense membrane technology, to effectively remove easy-deformable contaminant.
      • Photopex? Nylon Ultra-high Efficiency Filter 5nm removal retention. Using asymmetric membrane technology, to achieve higher flow rate and improve production operability. Using high purity PE structure and apply the ultra-clean technology to ensure filter's cleanliness.
      • Photopex Multi According to different application requirements, use Cobetter's know-how and experience to customize the product.
      • Photogile POU Filter for Lithography Process One-piece construction is easy to install, clean and replace this filter capsule
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